B.Y. Chen(陳伯宜), S.Z. Yang(楊祥之), J.R. Chen(陳建瑞)“Effect of the Additives on the Electrochemical Performance of Zinc Electrodes”. 真空科技第19卷第3期P.107-112(2006).
2
Bor-Yir Chen(陳伯宜), I-Sung Chen(陳義松), Jiann-Ruey Chen(陳建瑞)“Effect of heat-treatment on electrochemical properties of Ti-Ni-Cr based hydrogen storage alloys for Ni/MH batteries”. 真空科技第19卷第3期P.101-106(2006).
C. S. Hsu, H. H. Yu, and B. Y. Chen, March 2002, “Fabrication and investigation of the solid state polymer electrolyte films”, Journal of National Huwei Institute of Technology, 5, 72-85. ( NSC90-2815-C-150-007-E)
6
F.L. Jenq, J.R. Chen, B.Y. Chen and F.S. Yeh, 1997 “Simulation for the Microcrystalline Silicon Thin Film Transistors by Considering the Change of Acceptor-Like State and Microcrystal Grain Size Effect”, Jpn. J. Appl. Phys. V.36, 4246-4250. (SCI)
7
F.L. Jenq, J.R. Chen and B.Y. Chen, 1997 “Simulation for Microcrystal Gain Size Effect in the Microcrystalline Silicon Thin Film Transistors” Materials Chemistry and Physics Including Materials Science Communications 48, 207-211. (SCI)
8
B.Y. Chen, J.R. Chen, F.L. Jenq and C.S. Hong, 1996, "A Theoretical Analysis of Temperature Dependence on Hydrogenated Amorphous Silicon Thin-Film Transistors with Consideration of Resistance of the a-Si:H Film Layer as a Function of Temperature", Appl. Surf. Sci 100/101, 601-606. (SCI)
9
B.Y. Chen, W.H. Wu, J.R. Chen and C.S. Hong, 1995, "Temperature Dependence of Hydrogenated Silicon Thin-Film Transistors", J. Materials Science 30, 2254-2256. (SCI)
10
B.Y. Chen, J.R. Chen, F.L. Jenq and C.S. Hong, 1995, "A Theoretical Analysis of Temperature Dependence on Hydrogenated Amorphous Silicon Thin-Film Transistors", Materials Chemistry and Physics Including Materials Science Communications, Vol.42, pp.276-279.(SCI)
11
K.C. Hsu, B.Y. Chen, H.T. Hsu, K.C. Wang, T.R. Yew and H.L. Hwang, 1994, "Thin Film Transistors Made from Hydrogenated Microcrystalline Silicon", Jpn. J. Appl. Phys. 33, 639-642.(SCI)
12
B.Y. Chen, April 1988, ”Kinetics of the Thermal Oxidation of Wsi2 Thin-Film” , Journal of National Yuen-Lin Institute of Technology ,7,115-137(1988).
13
B.Y. Chen, May 1986, ”Investigation on Wsi2 Thin Film Oxidation by Si Radioactive Tracer Technique”, Journal of National Yuen-Lin Institute of Technology ,5, 407-419(1986).
14
J.R. Chen, B.Y. Chen, S.G. Wuu and Y.C. Lui, 1986, “Identification of Diffusing Species During Metal Silicide Oxidation by Rutherford Backscattering Spectrometry”, Nuclear Instruments and Methods in Physics Research B15, 280-284.(SCI)
B.Y. Chen(陳伯宜), S.Z. Yang(楊祥之), J.R. Chen(陳建瑞) “Effect of the Additives on the Electrochemical Performance of Zinc Electrodes”. ,2005年臺灣真空學會年會,國立虎尾科技大學,2006.2.17,真空科技第18卷第4期P.91(2006).
5
Bor-Yir Chen(陳伯宜), I-Sung Chen(陳義松), Jiann-Ruey Chen(陳建瑞)“Effect of heat-treatment on electrochemical properties of Ti-Ni-Cr based hydrogen storage alloys for Ni/MH batteries”. ,2005年臺灣真空學會年會,國立虎尾科技大學,2006.2.17, 真空科技第18卷第4期P.90(2006).
Wei-chiang Leea, Shin-kai Hsua, Jiann-Ruey Chena, Bor-Yir Chenb, Hsiu-Hua Lin, 2004,” Hydrogen ion-sensitive field effect transistor with silicon oxycarbide membrane deposited by Inductively Coupled Plasma method”, Proceeding of the 11th Symposium on Nano Device Technology (SNDT 2004), National Chiao Tung University, Hsinchu, Taiwan, May 11-13, 2004.PP.252.
9
J.R. Chen, I-Sung Chen and B.Y. Chen, 2001, “Effect of Heat-treatment on Electrochemical Properties of Ti-Ni-Cr Based Hydrogen Storage Alloys for Ni/MH Batteries”, Proceeding of the 4th International Symposium on Hydrogen Power- Theoretical and Engineering Solutions, HYPOTHESIS IV, Stralsund, Germany, September 9-14, 2001. pp.220-228. ( NSC 88 - 2216 - E – 150 - 003 -)
10
J.R. Chen, T.I. Tu and B.Y. Chen, 2001, “Investigation on the Performance of Ti-Zr-Ni-V Based Hydrogen Storage Alloys for Ni/MH Batteries”, Proceeding of the 4th International Symposium on Hydrogen Power- Theoretical and Engineering Solutions, HYPOTHESIS IV, Stralsund, Germany, September 9-14, 2001. pp.242-249.( NSC 89 - 2216 - E - 150 - 005 -)
11
B.Y Chen , J.R. Chen and I-Sung Chen, 2001, “Electrochemical Properties of Ti2Ni System Hydrogen Storage Alloys”, Proceeding of the 4th International Symposium on Hydrogen Power-Theoretical and Engineering Solutions, HYPOTHESIS IV, Stralsund, Germany, September 9-14, 2001. pp.235-241. ( NSC 88 - 2216 - E - 150 - 003 -)
12
B.Y. Chen , J.R. Chen and T.S. Lu, 2001, “Effect of the Hydrogen Storage Alloy by Binders and Additives on the Electrochemical Performance of Electrodes”, Proceeding of the 4th International Symposium on Hydrogen Power- Theoretical and Engineering Solutions, HYPOTHESIS IV, Stralsund, Germany, September 9-14, 2001. pp.229-234. ( NSC 86 - 2216 - E - 150 - 001 -)
13
J.R. Chen, G. Lien and B.Y. Chen, 2000, “The Effect of the Hydrogen Storage Alloy by Surface Modification on the Electrochemical Performance of Electrodes”, Proceeding of the International Hydrogen Energy Forum 2000 Policy; Business; Technology, Munich, Germany, September 11-15, 2000. pp.81-87. ( NSC 87 - 2216 - E - 150 - 003 -)
14
J.R. Chen, I.S. Chen and B.Y. Chen, 2000, “Charge and Discharge Performance of Ti2Ni Based Alloy Electrodes”, Proceeding of the International Hydrogen Energy Forum 2000 Policy; Business; Technology, Munich, Germany, September 11-15, 2000. ( NSC 88 - 2216 - E - 150 - 003 -)
15
B.Y. Chen, J.R. Chen and Huang-Chang Liang, 2000, “Charge and Discharge Performance of TiV1.6Ni0.4 Based Alloy Electrodes”, Proceeding of the International Hydrogen Energy Forum 2000 Policy; Business; Technology, Munich, Germany, September 11-15, 2000. pp.73-79. ( NSC 88 - 2216 - E - 150 - 003 -)
16
B.Y. Chen, J.R. Chen and T.I. Tu, 2000, “Effect of Alkali-treatment on Electrochemical Properties of Ti-Zr-Ni-V Based Hydrogen Storage Alloys for Ni/MH Batteries”, Proceeding of the International Hydrogen Energy Forum 2000 Policy; Business; Technology, Munich, Germany, September 11-15, 2000. pp.65-71. ( NSC 87 - 2216 - E - 150 - 003 -)
17
J. R. Chen and B. Y. Chen, 1999, “Charge and Discharge Performance of TiV1.6Ni0.4 Based Alloy Electrodes”, Proceeding of the 1st-Mini International Conference for Advanced Trends in Engineering, Minia, Egypt, March 14-17,1999.pp.223-235. ( NSC 88 - 2216 - E - 150 - 003 -)
18
B. Y. Chen and J. R. Chen, 1999, “The Effect of the Hydrogen Storage Alloy by Surface Modification on the Electrochemical Performance of Electrodes”, Proceeding of the 1st-Mini International Conference for Advanced Trends in Engineering, Minia, Egypt, March 14-17,1999.pp.210-222.( NSC 87 - 2216 - E - 150 - 003 -)
19
B. Y. Chen, J.R. Chen, F.L. Jenq and C.S. Hong,1995, “A Theoretical Analysis of Temperature Dependence on Hydrogenated Amorphous Silicon Thin-Film Transistors with the Consideration of Resistance of the a-Si:H Film Layer as a Function of Temperature”, in Applied Surface Science and Electronic Materials and Processing, Proceedings of the Sessions on Applied Surface Science and Electronic Materials and Processing of the 13th International Vacuum Congress and the 9th International Conference on Solid Surfaces, Yokohama, Japan 25-29 September 1995. Editors: A. Yoshimori, A. Hiraki and M. Kobayashi, Elsevier, Amsterdam, 1996. Vol.2, pp.601-606.
20
B.Y. Chen, J.R. Chen, F.L. Jenq, and C.S. Hong, 1995,"A Theoretical Analysis of Temperature Dependence on Hydrogenated Amorphous Silicon Thin-Film Transistors," Proc. Int. Union Mat. Res. Soc. pp. 523-528.
21
B.Y. Chen, W.H. Wu, J.R. Chen and C.S. Hong, 1994, "Temperature Dependence on Hydrogenated Silicon Thin-Film Transistors," Proc. of IUMRS-ICA Conference, pp.369-372.
22
B.Y. Chen, J.R. Chen, F.L. Jenq and C.S. Hong, 1994, "An Theoretical Analysis of Temperature Dependence on Hydrogenated Amorphous Silicon Thin-Film Transistors," IUMRS-ICEM, Final Program and Abstracts, p.126.
23
K.C. Hsu, B.Y. Chen, H.T. Hsu, K.C. Wang, T.R. Yew and H.L. Hwang, 1993, Hydrogenated Amorphous Silicon Thin Film Transistors Made by Novel Materials", ASID, pp.13-17.
24
K.C. Hsu, B.Y. Chen, H.T. Hsu, K.C. Wang, T.R. Yew and H.L. Hwang, 1993, "Hydrogenated Amorphous Silicon Thin Film Transistors Made by Novel Materials", Extended Abstracts of the 1994 International Conference on Solid State Devices and Materials, pp.434-436.
專利、專書或專書論文
1
陳長有,許振聲,陳伯宜, “機械工程實驗(I)-材料實驗”, 全華圖書公司出版.(1987)。
2
陳伯宜,”Investigation on Solid State Reaction between Tungsten Thin Film and Silicon, and on Wsi2 Thin Film Oxidation”. 清華大學碩士論文(1983)。
3
陳伯宜,”Studies on Hydrogenated Amorphous Silicon Thin-Film Transistors”. 清華大學博士論文(1995)。
技術報告及其他
1
陳伯宜, “射線檢測-移位攝影法研究”, 國科會專題研究成果報告, 計畫編號: NSC 82- 115 - C - 150 - 515 - E. 82.7.31。
K.C. Hsu, B.Y. Chen, H.T. Hsu, K.C. Wang, T.R. Yew and H.L. Hwang, 1993, "Hydrogenated Amorphous Silicon Thin Film Transistors Made by Novel Materials", Extended Abstracts of the 1994 International Conference on Solid State Devices and Materials, Hsinchu, Taiwan, pp.434-436.
2
B.Y. Chen, W.H. Wu, J.R. Chen and C.S. Hong, 1994, "Temperature Dependence on Hydrogenated Silicon Thin-Film Transistors," Proc. of IUMRS-ICA Conference,China, pp.369-372.
3
B. Y. Chen, J.R. Chen, F.L. Jenq and C.S. Hong,1995, “A Theoretical Analysis of Temperature Dependence on Hydrogenated Amorphous Silicon Thin-Film Transistors with the Consideration of Resistance of the a-Si:H Film Layer as a Function of Temperature”, in Applied Surface Science and Electronic Materials and Processing, Proceedings of the Sessions on Applied Surface Science and Electronic Materials and Processing of the 13th International Vacuum Congress and the 9th International Conference on Solid Surfaces, Yokohama, Japan 25-29 September 1995. Editors: A. Yoshimori, A. Hiraki and M. Kobayashi, Elsevier, Amsterdam, 1996. Vol.2, pp.601-606.
4
B. Y. Chen and J. R. Chen, 1999, “The Effect of the Hydrogen Storage Alloy by Surface Modification on the Electrochemical Performance of Electrodes”, Proceeding of the 1st-Mini International Conference for Advanced Trends in Engineering, Minia, Egypt, March 14-17,1999.pp.210-222.( NSC 87 - 2216 - E - 150 - 003 -).
5
B.Y. Chen, J.R. Chen and T.I. Tu, 2000, “Effect of Alkali-treatment on Electrochemical Properties of Ti-Zr-Ni-V Based Hydrogen Storage Alloys for Ni/MH Batteries”, Proceeding of the International Hydrogen Energy Forum 2000 Policy; Business; Technology, Munich, Germany, September 11-15, 2000. pp.65-71. ( NSC 87 - 2216 - E - 150 - 003 -).
6
B.Y. Chen , J.R. Chen and T.S. Lu, 2001, “Effect of the Hydrogen Storage Alloy by Binders and Additives on the Electrochemical Performance of Electrodes”, Proceeding of the 4th International Symposium on Hydrogen Power- Theoretical and Engineering Solutions, HYPOTHESIS IV, Stralsund, Germany, September 9-14, 2001. pp.229-234. ( NSC 86 - 2216 - E - 150 - 001 -).
7
Wei-chiang Leea, Shin-kai Hsua, Jiann-Ruey Chena, Bor-Yir Chenb, Hsiu-Hua Lin, 2004,” Hydrogen ion-sensitive field effect transistor with silicon oxycarbide membrane deposited by Inductively Coupled Plasma method”, Proceeding of the 11th Symposium on Nano Device Technology (SNDT 2004), National Chiao Tung University, Hsinchu, Taiwan, May 11-13, 2004.PP.252.